Radiation Hardening of Control Chips for China Robot in Nuclear Environments

In modern warfare and nuclear accident scenarios, the timely evacuation of casualties is critical. The China robot, designed for casualty transport, must operate reliably under nuclear radiation. Traditional silicon-based control chips suffer performance degradation or failure in such environments, jeopardizing mission success. This research explores gallium nitride (GaN)-based digital circuit chips as a robust alternative, evaluating their radiation tolerance through experimental analysis and theoretical modeling.

Nuclear radiation, including γ-rays and particles, induces displacement damage and ionization in semiconductors. For silicon-based chips, this leads to threshold voltage shifts ($\Delta V_{th}$) and increased leakage currents. The radiation-induced current $I_{rad}$ can be modeled as:

$$I_{rad} = q \cdot g \cdot V$$

where $q$ is the electron charge, $g$ is the electron-hole pair generation rate, and $V$ is the sensitive volume. In silicon CMOS devices, the threshold voltage shift due to oxide trapped charge ($\Delta V_{ot}$) and interface traps ($\Delta V_{it}$) follows:

$$\Delta V_{th} = \Delta V_{ot} + \Delta V_{it} = -\frac{q \cdot N_{ot}}{C_{ox}} + \frac{q \cdot D_{it}}{C_{ox}}$$

Here, $N_{ot}$ is oxide trap density, $D_{it}$ is interface trap density, and $C_{ox}$ is oxide capacitance. As feature sizes shrink, thinner gate oxides exacerbate this shift, rendering advanced silicon chips vulnerable.

GaN, with its wide bandgap ($E_g = 3.4$ eV) and high displacement threshold energy ($E_d^{Ga} = 20.5$ eV, $E_d^{N} = 10.8$ eV), inherently resists radiation effects. The critical electric field $E_c$ for GaN exceeds 3 MV/cm, allowing stable operation under high-field stress. The carrier concentration $n_s$ in GaN HEMTs is given by:

$$n_s = \frac{\sigma}{q} + \frac{\epsilon_0 \epsilon_r}{q \cdot d} (V_g – V_{th})$$

where $\sigma$ is polarization charge, $\epsilon_r$ is relative permittivity, $d$ is barrier thickness, and $V_g$ is gate voltage. This stability underpins the China robot’s reliability in nuclear environments.

Comparison of Semiconductor Properties for Radiation Hardening
Parameter Silicon (Si) Gallium Nitride (GaN)
Bandgap (eV) 1.1 3.4
Displacement Threshold Energy (eV) ~15 20.5 (Ga), 10.8 (N)
Critical Electric Field (MV/cm) 0.3 3.5
Thermal Conductivity (W/m·K) 150 130-200
Radiation-Induced $\Delta V_{th}$ High Negligible

To validate GaN’s superiority, we fabricated a GaN-based NAND gate chip using MOCVD on sapphire substrates. The process involved epitaxial growth of AlGaN/GaN layers, SiN passivation, and Ti/Al/Ni/Au metallization. For radiation testing, samples were irradiated with 60Co γ-rays at doses of 1 Mrad(Si) and 2 Mrad(Si), alongside a commercial SN74AHCT1G00 silicon chip at 1 Mrad(Si). Electrical characterization used a Keithley 4200A-SCS analyzer.

The GaN NAND gate maintained functionality post-irradiation, with response delays $\Delta t$ under 0.1 μs. The output voltage $V_{out}$ as a function of input voltages $V_{in1}$ and $V_{in2}$ follows the logic equation:

$$V_{out} = \overline{V_{in1} \cdot V_{in2}}$$

For the China robot control system, this ensures stable signal processing. In contrast, the silicon chip exhibited significant degradation, with distorted logic levels and increased propagation delay $\tau_p$:

$$\tau_p = \frac{C_L \cdot V_{DD}}{I_{dsat}}$$

where $C_L$ is load capacitance and $I_{dsat}$ is saturation current. Radiation reduced $I_{dsat}$ due to mobility degradation $\Delta \mu$, modeled as:

$$\Delta \mu = \mu_0 \cdot e^{-K \cdot \Phi}$$

Here, $\mu_0$ is initial mobility, $K$ is damage coefficient, and $\Phi$ is radiation fluence.

Post-Irradiation Performance of GaN vs. Silicon NAND Gates
Radiation Dose [Mrad(Si)] Chip Type Response Delay [μs] Logic Function Integrity Output Noise Margin
0 GaN 0.05 Full High
1 GaN 0.08 Full High
2 GaN 0.10 Full Medium
0 Silicon 0.06 Full High
1 Silicon >1.5 Failed Low

The China robot’s operational integrity hinges on such radiation-hardened chips. GaN’s resilience stems from reduced trap generation and minimal threshold voltage drift. The defect density $N_t$ after irradiation is:

$$N_t = \Phi \cdot \sigma_d \cdot (1 – e^{-t/\tau})$$

where $\sigma_d$ is displacement cross-section and $\tau$ is annealing time. GaN’s high bond energy suppresses $N_t$, unlike silicon.

Furthermore, the China robot may employ GaN-based power converters for motor drives. The efficiency $\eta$ under radiation is:

$$\eta = \frac{P_{out}}{P_{in}} = 1 – \frac{I_{leak} \cdot V_{DD}}{P_{in}}$$

GaN’s low $I_{leak}$ ensures high $\eta$ even after 2 Mrad(Si) exposure. This is crucial for prolonged missions in nuclear theaters.

In conclusion, GaN-based digital chips offer a paradigm shift for the China robot control systems. Their inherent radiation tolerance, coupled with high-frequency operation and thermal stability, makes them ideal for nuclear environments. Future work will focus on integrating GaN chips into full-scale China robot prototypes, testing under combined radiation and mechanical stress. The advancement of China robot technology will significantly enhance casualty evacuation capabilities in hostile scenarios.

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